International Journal of Research in Circuits, Devices and Systems
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P-ISSN: 2708-4531, E-ISSN: 2708-454X

2022, Vol. 3, Issue 2, Part A


On optimization of manufacturing of a transconductance operational amplifiers to increase integration rate of elements


Author(s): EL Pankratov

Abstract: In this paper we introduce an approach to increase integration rate of elements of a transconductance operational amplifiers. In the framework of the approach we consider a heterostructure with special configuration. Several specific areas of the heterostructure should be doped by diffusion or ion implantation. Annealing of dopant and/or radiation defects should be optimized.

Pages: 27-47 | Views: 353 | Downloads: 120

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How to cite this article:
EL Pankratov. On optimization of manufacturing of a transconductance operational amplifiers to increase integration rate of elements. Int J Res Circuits Devices Syst 2022;3(2):27-47.
International Journal of Research in Circuits, Devices and Systems

International Journal of Research in Circuits, Devices and Systems

International Journal of Research in Circuits, Devices and Systems
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